Page contents not supported in other languages.

Ion_implanter_schematic.png(500 × 486 pixels, file size: 32 KB, MIME type: image/png)

Summary

Description
English: Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. Image created using Tgif.
Date
Source Own work
Author Daniel Schwen
Other versions
File:Ion implanter schematic.svg is a vector version of this file. It should be used in place of this PNG file when not inferior.

File:Ion implanter schematic.png → File:Ion implanter schematic.svg

For more information, see Help:SVG.

In other languages
Alemannisch  Bahasa Indonesia  Bahasa Melayu  British English  català  čeština  dansk  Deutsch  eesti  English  español  Esperanto  euskara  français  Frysk  galego  hrvatski  Ido  italiano  lietuvių  magyar  Nederlands  norsk bokmål  norsk nynorsk  occitan  Plattdüütsch  polski  português  português do Brasil  română  Scots  sicilianu  slovenčina  slovenščina  suomi  svenska  Tiếng Việt  Türkçe  vèneto  Ελληνικά  беларуская (тарашкевіца)  български  македонски  нохчийн  русский  српски / srpski  татарча/tatarça  українська  ქართული  հայերեն  বাংলা  தமிழ்  മലയാളം  ไทย  한국어  日本語  简体中文  繁體中文  עברית  العربية  فارسی 
New SVG image

This image (or all images in this category) uses inside labels or attached captions in a specific script or language and should be converted to a language neutral form. This would allow its use in all Wikimedia projects and, more importantly, all Wikimedia languages.

Bahasa Melayu  català  čeština  Deutsch  English  español  français  italiano  magyar  Nederlands  Plattdüütsch  português  sicilianu  slovenčina  suomi  беларуская (тарашкевіца)‎  македонски  русский  српски / srpski  한국어  日本語  中文  中文(简体)‎  فارسی 

Licensing

GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.
w:en:Creative Commons
attribution share alike
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.
You are free:
  • to share – to copy, distribute and transmit the work
  • to remix – to adapt the work
Under the following conditions:
  • attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
  • share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
This licensing tag was added to this file as part of the GFDL licensing update.

Captions

Add a one-line explanation of what this file represents

Items portrayed in this file

depicts

creator

some value

author name string: Daniel Schwen
Wikimedia username: Dschwen

copyright status

copyrighted

copyright license

GNU Free Documentation License, version 1.2 or later

Creative Commons Attribution-ShareAlike 3.0 Unported

inception

3 July 2005

source of file

original creation by uploader

MIME type

image/png

File history

Click on a date/time to view the file as it appeared at that time.

Date/TimeThumbnailDimensionsUserComment
current21:48, 3 July 2005Thumbnail for version as of 21:48, 3 July 2005500 × 486 (32 KB)DschwenSchematics of an mass separating en:ion implantationimplantation/deposition setup. Ion energy at the substrate is determined by the difference of U<sub>accell</sub> and U<sub>decell</sub>. Image created by user:Dschwen u
No pages on the English Wikipedia use this file (pages on other projects are not listed).

Global file usage

The following other wikis use this file: